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Controllable synthesis of high quality monolayer WS2 on a SiO2/Si substrate by chemical vapor deposition

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DOI number:10.1039/c5ra00210a

Journal:RSC ADVANCES

Correspondence Author:xiangbin

Document Code:000349524700006

Volume:5

Issue:21

Page Number:15795-15799

ISSN No.:2046-2069

Translation or Not:no

Date of Publication:2014-11-30

Included Journals:SCI

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