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一种用于制作量子线超微细图形的光刻掩模
Release time:2021-07-24 Hits:
Affilication of Author(s): 中国科学技术大学
Disigner of the Invention: 夏安东,田杨超,hongyilin,阚娅,taoxiaoming,huyiguan,张新夷
Patent description: 实用新型
Application Number: 95203680.0
Number of Inventors: 8
Service Invention or Not: no
Publication Date: 1997-04-02
Authorization Date: 1997-04-02
First Author: fushaojun