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刘发林

博士生导师
硕士生导师
教师姓名:刘发林
教师英文名称:LIU Falin
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学历:博士研究生毕业
联系方式:0551-63601922
学位:工学博士学位
职称:研究员
毕业院校:中国科学技术大学
所属院系:信息科学技术学院
学科:电子科学与技术    信息与通信工程    
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论文成果
[3] Falin Liu (刘发林), A Unified Approach to the Analysis of a Category of H-plane Discontinuities,” International Journal of Infrared & mm-waves, 19(8), pp1103-1112, Aug. 1998.
发布时间:2021-08-01    点击次数:

发表刊物:International Journal of Infrared & mm-waves

关键字:Microwave CAD, Waveguide H-plane discontinuities, Generalized scattering parameters, Port-connection order-decrease method.

摘要:Based on the mode matching method, the generalized scattering parameters including the fundamental and higher order modes (multi-modes) are obtained for the discontinuity interface of a category of waveguide H-plane discontinuities. Then by using a general port-connection order-decrease method raised by the author, the whole discontinuity including the two interfaces and the intermediate part of finite length or zero length (as is the case for very thin inductive windows or irises) can be combined into one network, and the generalized scattering parameters of this network can be obtained from which the scattering parameters of the fundamental mode can be extracted. If needed, the equivalent circuit parameters can be calculated directly from the scattering parameters. Examples are given to show the validity and versatility of this new method for dielectric filled waveguide, inductive iris and/or window, E-plane metal and/or finline insert, and even the offset E-plane finline insert, etc.. Multiple inserts, windows and irises can also be analysed.

论文类型:期刊论文

学科门类:工学

文献类型:J

卷号:19

期号:8

页面范围:1103-1112

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发表时间:1998-08-25

收录刊物:SCI