DOI码：10.1088/0960-1317/22/12/125025

发表刊物：Journal of Micromechanics and Microengineering

摘要：Soft mold imprinting has been widely used to improve quality and uniformity in large area nano-imprint processes because of its flexibility. However, the aspect ratio of soft mold imprinting is limited because of its physical properties. In this paper, a multi-mask layers transfer process was demonstrated to realize a high aspect ratio in the soft mold imprint process. In this process, a thin hard mask was used as an intermediate mask for a high aspect ratio mask layer fabrication. Based on this, a 60 nm line width gratings mask, whose aspect ratio is higher than 4, was fabricated; we also realized a uniform photonic crystal (PC) pattern on large and rough gallium nitride (GaN) epitaxial wafers.

卷号：22

是否译文：否

发表时间：2012-11-09

发布期刊链接：https://iopscience.iop.org/article/10.1088/0960-1317/22/12/125025