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马锦秀

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Control of Beam Energy and Flux Ratio in an Ion-Beam-Background Plasma System Produced in a Double Plasma Device

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Impact Factor:1.358

DOI number:10.1088/1009-0630/18/11/04

Journal:PLASMA SCIENCE & TECHNOLOGY

Correspondence Author:majinxiu

Document Code:000387886700004

Volume:18

Issue:11

ISSN No.:1009-0630

Translation or Not:no

Date of Publication:2016-10-31

Included Journals:SCI

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