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一种电离层高度的反演方法
Release time:2021-07-24 Hits:
Affilication of Author(s): 中国科学技术大学
Disigner of the Invention: 王文伟,maming,Liu Feifan,秦子龙,陈燕玲,彭长志,沈鹏
Patent description: 发明
Application Number: 201810314787.7
Number of Inventors: 8
Service Invention or Not: no
Publication Date: 2018-09-18
First Author: ZHU baoyou