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"The Origin of Improved Electrical Double-Layer Capacitance by Topological Defects and Dopants in Graphene for Supercapacitors", Jiafeng Chen, Yulei Han, Xianghua Kong, Xinzhou Deng, Hyo Ju Park, Yali Guo, Song Jin, Zhikai Qi, Zonghoon Lee, Zhenhua Qiao*, Rodney S. Ruoff*, and Hengxing Ji* (*corresponding author), Angewandte Chemie International Edition 10, 1002 (2016)

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