中国科学技术大学 wangliang--Home-- In situ UV nano-imprint lithography alignment using high contrast mark

王亮

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Degree:博士

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In situ UV nano-imprint lithography alignment using high contrast mark

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Impact Factor:3.669

DOI number:10.1364/OE.23.018518

Journal:OPTICS EXPRESS

Correspondence Author:wangliang

Document Code:000361033900084

Volume:23

Issue:14

Page Number:18518-18524

ISSN No.:1094-4087

Translation or Not:no

Date of Publication:2015-07-13

Included Journals:SCI

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