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一种基于导模干涉的超分辨直写光刻机及其光刻方法

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Affilication of Author(s):中国科学技术大学

Disigner of the Invention:Douguo Zhang,王向贤,fuqiang,wangpei,minghai

Patent description:发明

Application Number:201110282032.1

Number of Inventors:6

Service Invention or Not:no

Publication Date:2012-02-15

Authorization Date:2013-06-26

First Author:陈漪恺

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