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王沛

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一种基于导模干涉的偶氮苯聚合物表面起伏光栅光刻机

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Affilication of Author(s):中国科学技术大学

Disigner of the Invention:Douguo Zhang,朱良富,陈漪恺,胡继刚,wangpei,minghai

Patent description:发明

Application Number:201310012735.1

Number of Inventors:7

Service Invention or Not:no

Publication Date:2013-04-17

Authorization Date:2014-12-10

First Author:王向贤

Pre One:一种基于波导束缚的荧光暗场显微装置及方法

Next One:一种基于表面等离子体干涉的可重构亚波长光栅光刻机