Induced-Photorefraction Attack against Quantum key Distribution
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DOI码：10.1103/PhysRevApplied.19.054052
发表刊物：Physical Review Applied
关键字：Network security; Niobium compounds; Photoreactivity; Quantum cryptography; Characteristic of materials; In:LiNbO3; Lithium niobate LiNbO3; Malicious attack; Photo refractions; Photorefractive effects; Practical systems; Quantum information processing; Special applications; Variable optical attenuators; Quantum optics
备注：citings: 1
第一作者：Ye, Peng
文献类型：Article
卷号：19
期号：5
ISSN号：23317019
是否译文：否
发表时间：2023-01-01