一种光栅掩模与硅片{111}晶面的对准方法

Affilication of Author(s):中国科学技术大学

Disigner of the Invention:liuzhengkun,qiukeqiang,郑衍畅,liuying,hongyilin

Patent description:发明

Application Number:201510793828.1

Number of Inventors:6

Service Invention or Not:no

Publication Date:2016-03-23

Authorization Date:2018-08-03

First Author:wangyu