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一种适用于超高真空环境的宽波段光斑聚焦装置

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  • Affilication of Author(s):中国科学技术大学

  • Disigner of the Invention:zhangbo,sunzhe,zhangguobin

  • Patent description:实用新型

  • Application Number:201821066949.1

  • Number of Inventors:4

  • Service Invention or Not:no

  • Publication Date:2019-06-07

  • Authorization Date:2019-06-07

  • First Author:liuyi

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