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刘发林

博士生导师
硕士生导师
教师姓名:刘发林
教师英文名称:LIU Falin
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学历:博士研究生毕业
联系方式:0551-63601922
学位:工学博士学位
职称:研究员
毕业院校:中国科学技术大学
所属院系:信息科学技术学院
学科:电子科学与技术    信息与通信工程    
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论文成果
[8] Falin Liu (刘发林), Weidong Wang, Weidong Chen, Yijian Sheng, “Coupling of NRD-guide Filled with Low Permittivity Dielectric between Waveguides,” International Journal of Infrared & mm-waves. 21(8), pp1331-1340, Aug. 2000.
发布时间:2021-08-01    点击次数:

发表刊物:International Journal of Infrared & mm-waves

关键字:NRD-guide, Low dielectric filling, Coupling

摘要:A new version of NRD-guide coupling structure is proposed in which a low permittivity dielectric is filled between the coupling waveguides. It takes full advantage of the common NRD-guide with more flexibility. The choice of different dielectric materials can optimize the required performance. The corresponding coupling characteristics are analyzed. Some examples are given to show the new coupling characteristics. An important feature is the enhanced coupling between the waveguides and increased attenuation in the transverse direction, and this implies a size reduction and enhanced EMC capability. Furthermore, the filling of the low dielectric material between the coupling waveguides makes the structure an integrated unit and especially suitable for realization by micro-electromechanical system (MEMS) or by microwave integrated circuits.

论文类型:期刊论文

学科门类:工学

文献类型:J

卷号:21

期号:8

页面范围:1331-1340

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发表时间:2000-08-15

收录刊物:SCI