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4、Shengzhou Huang, Mujun Li*, Lei Wang, Yongsheng Su and Yi Liang.Precise fabrication of large-area microstructures by digital oblique scanning lithography strategy and stage self-calibration technique. Applied Physics Express, 12(9): 096501 (2019)
发布时间：2021-07-24
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- 上一条：3、Chen Yang, Mujun Li*, Jianping Wang, Huichun Ye, Jinfeng Qiu. Residual layer assisted demolding in roll-to-roll UV imprint lithography. Microelectronic Engineering, Volume 217: 111110 ( 2019)
- 下一条：5、Shengzhou Huang, Mujun Li*, Lei Wang, Yongsheng Su and Yi Liang. A self-calibration method with high-accuracy and low-cost for large-area motion stage based on digital grating projection mode. Applied Physics Express, 12(12): 126503 (2019)