中国科学技术大学王思慧--中文主页-- Wang S, Zhu B, Gao Y, Shu X, Wei W, Zhang W, Wang Y. On the synergy manipulation between the activation temperature, surface resistance and secondary electron yield of NEG thin films[J]. Applied Surface Science, 2022, 578: 152101.

王思慧 ( 副研究员 )
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Wang S, Zhu B, Gao Y, Shu X, Wei W, Zhang W, Wang Y. On the synergy manipulation between the activation temperature, surface resistance and secondary electron yield of NEG thin films[J]. Applied Surface Science, 2022, 578: 152101.

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上一条： Zhang W, Zhu B, Wang S, Fan L, Fang J, Bian B, Li W, Wang Y. Surface characterization and secondary electron yield measurement of the Ti-Zr-V films deposited on laser-etched copper[J]. Journal of Instrumentation, 2022, 17: T08003.

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