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一种旋转刻蚀角度来刻蚀光栅槽型的方法
Release time:2021-07-23
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- Affilication of Author(s):
- 中国科学技术大学
- Disigner of the Invention:
- 吴丽翔,qiukeqiang,liuzhengkun,fushaojun
- Patent description:
- 发明
- Service Invention or Not:
- no
- Publication Date:
- 2016-02-17
- Authorization Date:
- 2017-12-22
- First Author:
- 曾思为
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