一种等离子体刻蚀装置及其扩散装置
Release time:2021-07-24
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- Affilication of Author(s):
- 中国科学技术大学
- Disigner of the Invention:
- qiukeqiang,liuzhengkun,xuxiangdong,hongyilin,fushaojun
- Patent description:
- 实用新型
- Service Invention or Not:
- no
- Publication Date:
- 2019-08-27
- Authorization Date:
- 2019-08-27
- First Author:
- 周腾
- Next One:一种平面双角闪耀光栅的制作方法


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