Zhihao Wang ,Tangyou Sun ,Lei Wang ,Qiang Zuo ,Yanli Zhao ,Zhimou Xu ,Wen Liu（刘文）, Application of multi-mask layers for high aspect ratio soft mold imprint. Journal of Micromechanics and Microengineering, 22（2012）125025）5pp

DOI number:10.1088/0960-1317/22/12/125025

Journal:Journal of Micromechanics and Microengineering

Abstract:Soft mold imprinting has been widely used to improve quality and uniformity in large area nano-imprint processes because of its flexibility. However, the aspect ratio of soft mold imprinting is limited because of its physical properties. In this paper, a multi-mask layers transfer process was demonstrated to realize a high aspect ratio in the soft mold imprint process. In this process, a thin hard mask was used as an intermediate mask for a high aspect ratio mask layer fabrication. Based on this, a 60 nm line width gratings mask, whose aspect ratio is higher than 4, was fabricated; we also realized a uniform photonic crystal (PC) pattern on large and rough gallium nitride (GaN) epitaxial wafers.

Volume:22

Translation or Not:no

Date of Publication:2012-11-09

Links to published journals:https://iopscience.iop.org/article/10.1088/0960-1317/22/12/125025